By Kash L. Mittal
A moment foreign symposium on adhesion points of skinny movies, held in Orlando, Florida in December 2003, improved from the 1st by means of contemplating metalized plastics and adhesion dimension. The 17 papers that caught to the publishing technique transparent to the top reflect on such themes as adhesion houses of functionally gradient diamond- like carbon nano-composite movies, characterizing polyethylene-metal composite skinny movies deposited through evaporation, the contribution of chemical reactions among aluminum atoms and varieties of practical teams to the adhesion of aluminum-polymer structures, and severe occasions saw on copper movies on glass substrate within the micro-scratch attempt. there isn't any index. VSP is a subsidiary of Brill.
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J. Narayan Figure 17. Antimicrobial susceptibility testing of silicon (100) control surface. The presence of Staphylococcus aureus growth on the silicon surface obscures surface imaging. Testing of microorganisms recovered from clinical specimens is not a simple undertaking. The inhibitory activity of an antimicrobial agent is assessed either by dilution testing, which is a quantitative measure, or by disk diffusion testing, which is a qualitative measure. Disk diffusion allows classification of antimicrobial agents.
5-ymthick titanium carbide-DLC nanocomposite film on steel prepared using a hybrid magnetron sputtering/pulsed laser deposition technique. Evaluation of the adhesion between coating and substrate was performed using a CSM Microscratch instrument. Scratch adhesion testing is commonly used for determining the integrity of coated substrates [ 15, 161, The coating-substrate response to scratch testing may be separated into three regimes. In regime one, mild plastic deformation is observed up to tensile cracking.
Details of the system were described elsewhere . 33 x Pa, and the substrates were heated to 150°C for 20 min for outgasing. To study the effect of plasma cleaning on the surface morphology of the cemented carbide substrate, argon gas was introduced to generate an intense plasma to sputter the substrate under a constant negative potential. 4 Pa. The bias powers of 100, 200, 300, 400 and 500 W were used and the cleaning duration was 20 min. The cleaned substrates were then examined at SEM for morpholgy.
Adhesion Aspects Of Thin Films by Kash L. Mittal